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Thin
Film Deposition Trends,
Key Issues, Market Analysis |
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TABLE OF CONTENTS |
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Chapter 1 |
Introduction |
1-1 |
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Chapter 2 |
Executive Summary |
2-1 |
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Chapter 3 |
Physical Vapor Deposition |
3-1 |
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3.1 |
Introduction |
3-1 |
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3.2 |
Sputtering Technology |
3-2 |
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3.3 |
Plasma Technology |
3-5 |
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3.4 |
Reactor Designs |
3-14 |
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3.4.1 |
Long-Throw Deposition |
3-14 |
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3.4.2 |
Collimated Sputter Deposition |
3-16 |
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3.4.3 |
Showerhead Deposition |
3-18 |
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3.4.4 |
Ionized PVD |
3-22 |
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3.5 |
Semiconductor Processing |
3-28 |
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3.5.1 |
Feature Patterning |
3-28 |
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3.5.2 |
Gap Fill |
3-31 |
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3.6 |
Targets |
3-34 |
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Chapter 4 |
Chemical Vapor Deposition |
4-1 |
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4.1 |
Introduction |
4-1 |
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4.2 |
Chemical Vapor Deposition (CVD) Techniques |
4-1 |
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4.2.1 |
APCVD |
4-1 |
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4.2.2 |
LPCVD |
4-5 |
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4.2.3 |
PECVD |
4-8 |
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4.2.4 |
HDPCVD |
4-13 |
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4.2.5 |
ALD |
4-19 |
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Chapter 5 |
Electrochemical Deposition |
5-1 |
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5.1 |
Introduction |
5-1 |
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5.2 |
Reactor Design |
5-5 |
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5.3 |
Challenges |
5-6 |
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5.4 |
Additives |
5-8 |
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5.5 |
Processing |
5-9 |
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5.5.1 |
Superfilling |
5-9 |
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5.5.2 |
Aspect Ratios |
5-9 |
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5.6 |
Copper Cathodes |
5-10 |
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Chapter 6 |
Film Deposition And Film Properties |
6-1 |
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6.1 |
Introduction |
6-1 |
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6.2 |
Dielectric Deposition |
6-4 |
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6.2.1 |
Silicon Dioxide |
6-5 |
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6.2.1.1 |
Thermal CVD |
6-5 |
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6.2.1.2 |
PECVD |
6-6 |
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6.2.1.3 |
HDPCVD |
6-9 |
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6.2.2 |
Silicon Nitride |
6-13 |
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6.2.2.1 |
Thermal CVD |
6-13 |
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6.2.2.2 |
PECVD |
6-14 |
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6.2.2.3 |
HDPCVD |
6-19 |
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6.2.3 |
Other Oxides |
6-19 |
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6.2.4 |
Low-K Dielectrics |
6-20 |
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6.3 |
Metal Deposition |
6-21 |
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6.3.1 |
Aluminum |
6-21 |
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6.3.2 |
Tungsten/Tungsten Silicide |
6-24 |
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6.3.3 |
Titanium Nitride |
6-26 |
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Chapter 7 |
Vendor Issues |
7-1 |
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7.1 |
Introduction |
7-1 |
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7.2 |
300mm Processing |
7-6 |
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7.3 |
Integrated Processing |
7-9 |
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7.4 |
Copper |
7-13 |
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7.5 |
Metrology |
7-16 |
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7.6 |
ESD |
7-19 |
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7.7 |
Parametric Test |
7-20 |
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Chapter 8 |
Market Forecast |
8-1 |
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8.1 |
Introduction |
8-1 |
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8.2 |
Key Issues |
8-4 |
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8.3 |
Market Forecast Assumptions |
8-6 |
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8.4 |
Market Forecast |
8-8 |
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8.4.1 |
Chemical Vapor Deposition |
8-8 |
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8.4.2 |
Physical Vapor Deposition |
8-24 |
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8.4.3 |
Copper Electroplating Market |
8-28 |
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8.4.4 |
Atomic Layer Deposition Market |
8-31 |
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LIST OF
FIGURES |
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3.1 |
Schematic Of Sputtering System |
3-3 |
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3.2 |
Magnetron Sputtering Design |
3-9 |
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3.3 |
Showerhead Reactor Design |
3-19 |
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3.4 |
Ionized PVD |
3-24 |
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4.1 |
APCVD Reactor |
4-3 |
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4.2 |
Tube CVD Reactor |
4-7 |
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4.3 |
HDPCVD Reactor |
4-17 |
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5.1 |
Copper Electroplating System |
5-3 |
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8.1 |
Worldwide MCVD Market Shares |
8-12 |
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8.2 |
Worldwide DCVD Market Shares |
8-13 |
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8.3 |
Worldwide DCVD Market By Sectors |
8-15 |
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8.4 |
Worldwide HDHCVD Market Shares |
8-17 |
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8.5 |
Worldwide PECVD Market Shares |
8-19 |
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8.6 |
Worldwide SACVD Market Shares |
8-21 |
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8.7 |
Worldwide LPCVD Market Shares |
8-23 |
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8.8 |
Worldwide PVD Market Shares |
8-27 |
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8.9 |
Worldwide ECD Market Shares |
8-30 |
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8.10 |
ALD Applications a Share of Market |
8-35 |
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8.11 |
Worldwide ALD Market Shares |
8-36 |
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LIST OF
TABLES |
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8.1 |
Worldwide CVD Market Forecast |
8-9 |
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8.2 |
Worldwide MCVD Market Shares |
8-10 |
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8.3 |
Worldwide DCVD Market Shares |
8-11 |
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8.4 |
Worldwide HDPCVD Market Shares |
8-16 |
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8.5 |
Worldwide PECVD Market Shares |
8-18 |
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8.6 |
Worldwide SACVD Market Shares |
8-20 |
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8.7 |
Worldwide LPCVD Market Shares |
8-22 |
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8.8 |
Worldwide PVD Market Forecast |
8-25 |
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8.9 |
Worldwide PVD Market Shares |
8-26 |
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8.10 |
Worldwide ECD Market Forecast |
8-29 |
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8.11 |
Worldwide ALD Market Forecast |
8-34 |